SU-8 Resists
SU-8 Resists
SU-8 Resists are high contrast, epoxy-based negative photoresists capable of a wide range of µm in a single coat step.
Pack Sizes and Applications:
500
ml
1
LITRE
4
LITRES
- MEMS
- Microfluidics
- Optoelectronics
- Displays
Material Features:
- It can cover ranges of 0.5->200 um
- Resistant to solvents, acids and bases
- Offers excellent thermal and mechanical stability
- They perform well when fabricating permanent structures including pixel walls, fluidic channels and nozzles, micro array and spacers
Manufacturer:
Discover the technical details of SU-8 XFT 75 & 100 epoxy photoresist
For engineers and specialists seeking high-performance solutions, our SU-8 XFT 75 & 100 series offers exceptional results for micromachining and micro-electronic applications. Designed for ultra-thick film processes, this high contrast, epoxy-based photoresist delivers outstanding adhesion, reduced coating stress, and superior imaging capabilities.
Download the full technical data sheet to explore specifications, processing guidelines, and application benefits.
