Nanoimprint Lithography
Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL)
Features and Benefits:
- Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL)
- Coating of various substrates with excellent film quality (Si, SiO2, glass, Al, Al2O3, plastics)
- Excellent pattern replication fidelity using various mold materials (Si, SiO2, Ni, OrmoStamp®)
- Superior mold release properties
- Numerous application areas (pattern transfer using dry etch processes, permanent applications)
- Customized solutions and resist formulations designed for industrial high throughput processes
- Safe solvents specified for industrial requirements
- Guaranteed product quality and processing reproducibility
- Manufacturing according to ISO 9001 and ISO 14001
Manufacturer:
