The mr-NIL212FC Series is a purely organic and photo-curable NIL resist specifically developed for the manufacturing of sub-100nm feature sizes via soft UV-NIL in combination with PDMS-based working stamp materials and low-intensity light exposure sources.
It features a strongly increased etching stability in RIE processes compared to mr-NIL210, whereas, all the well-established imprint features are still retained.
Product Features:
The mr-NIL212FC Series is a purely organic and photo-curable NIL resist specifically developed for the manufacturing of sub-100nm feature sizes via soft UV-NIL in combination with PDMS-based working stamp materials and low-intensity light exposure sources.
It features a strongly increased etching stability in RIE processes compared to mr-NIL210, whereas, all the well-established imprint features are still retained.
Manufacturers:
