mr I 7000R
                    
        
            
            
        - Excellent properties for thermal NIL
 • Short cycle times due to fast polymer flow
 • Sub-20 nm resolution
 • Low residual layer thickness
 • Low release forces
- Longer lifetime of anti-sticking layers on the stamp
- High plasma etch resistance
 
                    Product Features:
- Excellent properties for thermal NIL
 • Short cycle times due to fast polymer flow
 • Sub-20 nm resolution
 • Low residual layer thickness
 • Low release forces
- Longer lifetime of anti-sticking layers on the stamp
- High plasma etch resistance
Manufacturers:

