ma-P 1200
ma-P 1200 is a positive photoresist, manufactured by Micro Resist Technology.
Pack Sizes and Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- Mask for etching, for example Si, SiO2, Metals and Semiconductors
- Mask for ion implantation
- Mould for electroplating
Material features:
- It enables high pattern stability in Wet Etch processes and acid and alkaline plating baths
- It is highly stable in Dry Etch processes such as CHF3, CF4 and SF6
- It has aqueous alkaline development properties and is easy to remove
- The resists available in a variety of viscosities
Manufacturer:
