Ma-N 1400
Ma-N 1400 is a negative tone photoresist series designed for the use in microelectronics and microsystems technology.
Pack Sizes and Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- Microelectronics and micro systems technology
- Mask for lift-off processes
- Etch mask for semiconductors and metals
- Well suitable for implantation
- Mould for electroplating
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Material Features:
- The resists are available in a variety of viscosities–
- Ma-N 1400 is suitable as an etch mask exhibiting high dry and wet etch resistance
- Excellent for pattern transfer with PVD and lift-off processes
- High thermal stability of the resist patterns
- Aqueous alkaline development
Manufacturer:
