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Eagle™ 2100 ED Photoresist

Eagle™ 2100 ED Photoresist is a photo-imageable negative-working coating that is electrodeposited from an aqueous emulsion.

Pack Sizes:

20

LITRES

Material Features:

  • Developed primarily for the manufacture of fine-line MLB Innerlayers and other applications where a thin, uniform, chemically- resistant photoresist film is desired
  • The coating withstands common acid and alkaline etchants and plating solutions
  • Eagle™ 2100 ED Photoresist is cataphoretically deposited onto electrically-conductive substrates regardless of shape or geometric complexity
  • After coating, Eagle™ 2100 ED Photoresist is imaged using actinic radiation at wavelengths employed for common CBT photolithographic processes.

Manufacturer: